Photon Initiators:
Photosensitive resin
Linear phenolic resin for photoresist is an electronic grade high-purity cresol phenolic resin. Through the design of molecular structure, the product has excellent high temperature resistance, suitable alkali dissolution rate, and the control of various metal impurities in the resin reaches ppb level. It is suitable for the production of various photoresist products. It is recommended to be used in high-end application fields such as electronic glass etching and IC chip etching.
We can provide a variety of phenolic resins for photoresist with different pair ratios, different molecular weights and different alkali dissolution rates, which can be used in the field of lithography processing with different heat resistance grades and different resolution requirements.
PHOTON INITIATORS
As a new generation of laser three-dimensional micromachining technology, photon stereo lithography has the processing ability of nano direct three-dimensional molding.
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PHOTON PHOTORESIST |
CHARACTERISTIC |
APPLICATION |
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FPR |
Low polymerization threshold, fast forming speed |
Micro nano optical devices (optical waveguides, photonic crystals, diffractive optical devices), microfluidic, etc |
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CPR |
Low shrinkage and high forming accuracy |
MEMS |
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WPR |
Water soluble two-photon photoresist has good biocompatibility |
Life sciences: cell scaffolds, biosensors, cell behavior research |